The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 23, 2013
Filed:
Mar. 14, 2011
Anwar Irmatov, Moscow, RU;
Alexander Belousov, Moscow, RU;
Eitan Cadouri, Cupertino, CA (US);
Andrei Gratchev, Moscow, RU;
Alexander Ryjov, Moscow, RU;
Laurent Thenie, Peynier, FR;
Anwar Irmatov, Moscow, RU;
Alexander Belousov, Moscow, RU;
Eitan Cadouri, Cupertino, CA (US);
Andrei Gratchev, Moscow, RU;
Alexander Ryjov, Moscow, RU;
Laurent Thenie, Peynier, FR;
Cadence Design Systems, Inc., San Jose, CA (US);
Abstract
Disclosed is an improved approach for organizing, analyzing, and operating upon polygon data which significantly reduces the amount of data required for processing while keeping elements non-interfacing with each other. According to one approach, clusters of elements are extracted which are then handled separately. In some approaches, a set of polygons forms a cluster if for any two polygons from the set of polygons there exists a sequence of polygons from the set such that the distance between any sequential polygons are less than or equal to a given threshold number. Rather than analyzing each and every polygon in the design, repetitive unique patterns are analyzed once, which are then replicated for all clusters which have the same repetitive pattern.