The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 23, 2013
Filed:
Oct. 22, 2008
George Vakanas, Tempe, AZ (US);
George Chen, Los Gatos, CA (US);
Yuval Greenzweig, Ramat Hasharon, IL;
Eric LI, Chandler, AZ (US);
Sergei Voronov, Chandler, AZ (US);
George Vakanas, Tempe, AZ (US);
George Chen, Los Gatos, CA (US);
Yuval Greenzweig, Ramat Hasharon, IL;
Eric Li, Chandler, AZ (US);
Sergei Voronov, Chandler, AZ (US);
Intel Corporation, Santa Clara, CA (US);
Abstract
The present invention discloses an apparatus including: a laser beam directed at a wafer held by a chuck mounted on a stage inside a process chamber; a focusing mechanism for the laser beam; a steering mechanism for the laser beam; an optical scanning mechanism for the laser beam; a mechanical scanning system for the stage; an etch chemical induced by the laser beam to etch the wafer and form volatile byproducts; a gas feed line to dispense the etch chemical towards the wafer; and a gas exhaust line to remove any excess of the etch chemical and the volatile byproducts.