The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 23, 2013
Filed:
Feb. 05, 2010
Makoto Satake, Kokubunji, JP;
Kenji Maeda, Kudamatsu, JP;
Kenetsu Yokogawa, Tsurugashima, JP;
Tsutomu Tetsuka, Kasumigaura, JP;
Tatehito Usui, Kasumigaura, JP;
Ryoji Nishio, Kudamatsu, JP;
Makoto Satake, Kokubunji, JP;
Kenji Maeda, Kudamatsu, JP;
Kenetsu Yokogawa, Tsurugashima, JP;
Tsutomu Tetsuka, Kasumigaura, JP;
Tatehito Usui, Kasumigaura, JP;
Ryoji Nishio, Kudamatsu, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
In processing a magnetic film composed for example of Fe, Co or Ni formed on a substrate and a nonvolatile metal containing the same in a vacuum reactor using a plasma generating gas for generating plasma and a gas containing C and O, a power applied to an antenna for generating plasma is time-modulated, wherein the feeding of gas containing C and O to the vacuum reactor is synchronized with the time-modulated antenna power so that the supply of gas containing C and O to the vacuum reactor is suppressed when the antenna power is high and the gas containing C and O is fed to the vacuum reactor when the antenna power is low.