The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 02, 2013
Filed:
Aug. 12, 2010
Hendrik Jan Hidde Smilde, Veldhoven, NL;
Arno Jan Bleeker, Westerhoven, NL;
Arie Jeffrey Den Boef, Waalre, NL;
Armand Eugene Albert Koolen, Nuth, NL;
Henricus Petrus Maria Pellemans, Veldhoven, NL;
Reinder Teun Plug, Eindhoven, NL;
Willem Marie Julia Marcel Coene, Geldrop, NL;
Hendrik Jan Hidde Smilde, Veldhoven, NL;
Arno Jan Bleeker, Westerhoven, NL;
Arie Jeffrey Den Boef, Waalre, NL;
Armand Eugene Albert Koolen, Nuth, NL;
Henricus Petrus Maria Pellemans, Veldhoven, NL;
Reinder Teun Plug, Eindhoven, NL;
Willem Marie Julia Marcel Coene, Geldrop, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A metrology apparatus is arranged to illuminate a plurality of targets with an off-axis illumination mode. Images of the targets are obtained using only one first order diffracted beam. Where the target is a composite grating, overlay measurements can be obtained from the intensities of the images of the different gratings. Overlay measurements can be corrected for errors caused by variations in the position of the gratings in an image field.