The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 26, 2013
Filed:
Feb. 25, 2010
Toshihiko Nakata, Hiratsuka, JP;
Masahiro Watanabe, Yokohama, JP;
Takashi Inoue, Yokohama, JP;
Kishio Hidaka, Hitachioota, JP;
Makoto Okai, Tokorozawa, JP;
Motoyuki Hirooka, Hitachi, JP;
Toshihiko Nakata, Hiratsuka, JP;
Masahiro Watanabe, Yokohama, JP;
Takashi Inoue, Yokohama, JP;
Kishio Hidaka, Hitachioota, JP;
Makoto Okai, Tokorozawa, JP;
Motoyuki Hirooka, Hitachi, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
In a scanning probe microscope, a nanotube and metal nano-particles are combined together to configure a plasmon-enhanced near-field probe having an optical resolution on the order of nanometers as a measuring probe in which a metal structure is embedded, and this plasmon-enhanced near-field probe is installed in a highly-efficient plasmon exciting unit to repeat approaching to and retracting from each measuring point on a sample with a low contact force, so that optical information and profile information of the surface of the sample are measured with a resolution on the order of nanometers, a high S/N ratio, and high reproducibility without damaging both of the probe and the sample.