The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 26, 2013
Filed:
May. 06, 2010
Laurentius Johannes Adrianus Van Bokhoven, Veldhoven, NL;
Nicolaas Ten Kate, Almkerk, NL;
Raymond Wilhelmus Louis Lafarre, Helmond, NL;
Henricus Jozef Castelijns, Bladel, NL;
Petrus Martinus Gerardus Johannes Arts, Echt, NL;
Laurentius Johannes Adrianus Van Bokhoven, Veldhoven, NL;
Nicolaas Ten Kate, Almkerk, NL;
Raymond Wilhelmus Louis Lafarre, Helmond, NL;
Henricus Jozef Castelijns, Bladel, NL;
Petrus Martinus Gerardus Johannes Arts, Echt, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
In an all-wet immersion lithographic apparatus, the immersion liquid is allowed to flow off an edge of the substrate table. The immersion liquid is moved with the substrate table during exposure. The motion of the immersion liquid may result in a disturbance and/or de-wetting. A geometry of the substrate table is proposed that may reduce such a disturbance and/or de-wetting. The cross-sectional edge profile of the substrate table and/or the plan shape of the substrate table are considered.