The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 05, 2013
Filed:
Feb. 15, 2011
Applicants:
Takashi Ogawa, Chiba, JP;
Kenichi Nishinaka, Chiba, JP;
Yoshihiro Koyama, Chiba, JP;
Inventors:
Assignee:
SII NanoTechnology Inc., , JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 49/10 (2006.01); H01J 37/08 (2006.01); H01J 27/02 (2006.01); H01J 3/14 (2006.01);
U.S. Cl.
CPC ...
Abstract
A focused ion beam apparatus includes an ion gun unit having an emitter tip, a gas supply unit that supplies gas to the tip, and an ion source gas supply source. An extracting electrode ionizes the gas adsorbed onto the surface of the tip and extracts ions by applying a voltage between the extracting electrode and the tip. A cathode electrode accelerates the ions toward a sample. An aperture member has an opening that passes therethrough a part of the ion beam ejected from the ion gun unit, and a lens system focuses the ion beam onto the sample.