The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 26, 2013
Filed:
Feb. 05, 2008
Toshihisa Nozawa, Amagasaki, JP;
Kotaro Miyatani, Nirasaki, JP;
Toshiyasu Hori, Nirasaki, JP;
Shigekazu Hirose, Nirasaki, JP;
Toshihisa Nozawa, Amagasaki, JP;
Kotaro Miyatani, Nirasaki, JP;
Toshiyasu Hori, Nirasaki, JP;
Shigekazu Hirose, Nirasaki, JP;
Tokyo Electron Limited, , JP;
Abstract
An etching method by which a fluorine-added carbon film formed on a substrate is etched by plasma includes a first step of etching the fluorine-added carbon film with plasma of an oxygen-containing processing gas, and a second step of etching the fluorine-added carbon film with plasma of a fluorine-containing processing gas.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile