The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 26, 2013
Filed:
Aug. 29, 2007
Applicants:
Yue MA, Shanghai, CN;
Chuan He, Shanghai, CN;
Zhenxu Pang, Shanghai, CN;
David Wang, Shanghai, CN;
Voha Nuch, Shanghai, CN;
Inventors:
Yue Ma, Shanghai, CN;
Chuan He, Shanghai, CN;
Zhenxu Pang, Shanghai, CN;
David Wang, Shanghai, CN;
Voha Nuch, Shanghai, CN;
Assignee:
ACM Research (Shanghai) Inc., , CN;
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
The present invention provides an apparatus and method for rapid and uniform thermal treatment of semiconductor workpieces in two closely arranged thermal treatment chambers with a retractable door between them. The retractable door moves in between two thermal treatment chambers during heating or cooling process, and additional heating and cooling sources are provided for double-side thermal treatment of the semiconductor workpiece.