The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 26, 2013
Filed:
Oct. 16, 2008
Rikimaru Sakamoto, Toyama, JP;
Yoshiomi Hiroi, Toyama, JP;
Tomohisa Ishida, Toyama, JP;
Takafumi Endo, Toyama, JP;
Rikimaru Sakamoto, Toyama, JP;
Yoshiomi Hiroi, Toyama, JP;
Tomohisa Ishida, Toyama, JP;
Takafumi Endo, Toyama, JP;
Nissan Chemical Industries, Ltd., Tokyo, JP;
Abstract
There is provided a composition for forming a resist underlayer film not only having a large selection ratio of a dry etching rate but also exhibiting desired values of the k value and of the refractive index n at a short wavelength such as a wavelength of an ArF excimer laser. A resist underlayer film forming composition for lithography comprising: a linear polymer; and a solvent, wherein a backbone of the linear polymer has a unit structure in which 2,4-dihydroxy benzoic acid is introduced through an ester bond and an ether bond.