The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 26, 2013
Filed:
Feb. 22, 2011
Toru Shirasaki, Annaka, JP;
Kunihiro Ito, Tokyo, JP;
Toru Shirasaki, Annaka, JP;
Kunihiro Ito, Tokyo, JP;
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Abstract
Provided are a pellicle for lithography which can prevent a haze from being generated on a photomask even if a short wave length laser such as an ArF excimer laser is used for a long period of time, and a method for producing a pellicle film to be attached to the pellicle for lithography. The pelliclefor lithography is comprised of a frame-like pellicle framehaving one open frame on one side of the pellicle frame and another open frame on another side of the pellicle frame; and a laser beam transmissive pellicle filmfor lithography, which is attached to the one side of the pellicle frame. The another open frame is capable of attaching to a photomaskand the pellicle film has a venting holehaving a hole size through which a gas moleculecan pass but not a foreign particle