The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 19, 2013
Filed:
Apr. 27, 2012
Yu-tsung Lin, Taichung County, TW;
Hsin-ping Wu, Hsinchu, TW;
Hung-chao Kao, Taipei, TW;
Ming-i Wang, Taipei County, TW;
Yu-Tsung Lin, Taichung County, TW;
Hsin-Ping Wu, Hsinchu, TW;
Hung-Chao Kao, Taipei, TW;
Ming-I Wang, Taipei County, TW;
United Microelectronics Corp., Hsinchu, TW;
Abstract
A method of fabricating a contiguous microlens array is disclosed. First, an array of photoresist patterns is formed, wherein each photoresist pattern has a substantially circular or polygonal shape in a top view and neighboring photoresist patterns are connected with each other or close to each other. Then a reflow step is performed to heat the photoresist patterns thereby rounding a surface of each photoresist pattern and connecting the neighboring photoresist patterns that are close to each other. Finally, a fixing step is performed to fix a shape of each photoresist pattern. The shape of the curved surface of a microlens in the microlens array is selectively adjusted according to its position in the array and the incident angle of light incident thereto.