The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 05, 2013
Filed:
Nov. 30, 2009
Johannes Petrus Martinus Bernardus Vermeulen, Helmond, NL;
Marcel Koenraad Marie Baggen, Nuenen, NL;
Hans Butler, Best, NL;
Henrikus Herman Marie Cox, Eindhoven, NL;
Jan Van Eijk, Eindhoven, NL;
Andre Bernardus Jeunink, Bergeijk, NL;
Nicolaas Rudolf Kemper, Eindhoven, NL;
Robert-han Munnig Schmidt, Hapert, NL;
Engelbertus Antonius Fransiscus Van Der Pasch, Oirschot, NL;
Marc Wilhelmus Maria Van Der Wijst, Veldhoven, NL;
Theodorus Petrus Maria Cadee, Vlierden, NL;
Fransiscus Mathijs Jacobs, Asten, NL;
Christiaan Louis Valentin, 's-Gravenzande, NL;
Johannes Petrus Martinus Bernardus Vermeulen, Helmond, NL;
Marcel Koenraad Marie Baggen, Nuenen, NL;
Hans Butler, Best, NL;
Henrikus Herman Marie Cox, Eindhoven, NL;
Jan Van Eijk, Eindhoven, NL;
Andre Bernardus Jeunink, Bergeijk, NL;
Nicolaas Rudolf Kemper, Eindhoven, NL;
Robert-Han Munnig Schmidt, Hapert, NL;
Engelbertus Antonius Fransiscus Van Der Pasch, Oirschot, NL;
Marc Wilhelmus Maria Van Der Wijst, Veldhoven, NL;
Theodorus Petrus Maria Cadee, Vlierden, NL;
Fransiscus Mathijs Jacobs, Asten, NL;
Christiaan Louis Valentin, 's-Gravenzande, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus includes a position controller configured to control a position of a patterning device in its planar direction by selectively pressing at least one of the side faces of the patterning device. The position controller includes a gas pressure supply and one or more outflow openings directed towards at least one side face of the patterning device so as to exert pressurized gas on this side face in order to control the position of the patterning device in its planar direction in a contactless manner.