The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 05, 2013
Filed:
Feb. 25, 2010
Applicants:
Dzmitry Labetski, Utrecht, NL;
Erik Roelof Loopstra, Eindhoven, NL;
Gerardus Hubertus Petrus Maria Swinkels, Eindhoven, NL;
Tom Van Zutphen, Eindhoven, NL;
Inventors:
Dzmitry Labetski, Utrecht, NL;
Erik Roelof Loopstra, Eindhoven, NL;
Gerardus Hubertus Petrus Maria Swinkels, Eindhoven, NL;
Tom Van Zutphen, Eindhoven, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05H 1/42 (2006.01); H05H 1/00 (2006.01); H01J 61/28 (2006.01); H01J 37/08 (2006.01);
U.S. Cl.
CPC ...
Abstract
A plasma radiation source includes a vessel configured to catch a source material transmitted along a trajectory, and a decelerator configured to reduce a speed of the source material in a section of the trajectory downstream of a plasma initiation site.