The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 05, 2013
Filed:
Jan. 11, 2008
Mamoru Nakasuji, Yokohama, JP;
Takao Kato, Tokyo, JP;
Nobuharu Noji, Zushi, JP;
Tohru Satake, Chigasaki, JP;
Takeshi Murakami, Tokyo, JP;
Kenji Watanabe, Fujisawa, JP;
Mamoru Nakasuji, Yokohama, JP;
Takao Kato, Tokyo, JP;
Nobuharu Noji, Zushi, JP;
Tohru Satake, Chigasaki, JP;
Takeshi Murakami, Tokyo, JP;
Kenji Watanabe, Fujisawa, JP;
Ebara Corporation, Tokyo, JP;
Abstract
An electron beam apparatus, in which an electron beam emitted from an electron gun having a cathode and an anode is focused and irradiated onto a sample, and secondary electrons emanated from the sample are directed into a detector, the apparatus further comprising means for optimizing irradiation of the electron beam emitted from the electron gun onto the sample, the optimizing means may be two-stage deflectors disposed in proximity to the electron gun which deflects and directs the electron beam emitted in a specific direction so as to be in alignment with the optical axis direction of the electron beam apparatus, the electron beam emitted in the specific direction being at a certain angle with respect to the optical axis due to the fact that, among the crystal orientations of said cathode, a specific crystal orientation allowing a higher level of electron beam emission out of alignment with the optical axis direction.