The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 29, 2013
Filed:
Oct. 19, 2010
Vladimir Vitalevitch Ivanov, Moscow, RU;
Vadim Yevgenyevich Banine, Helmond, NL;
Konstantin Nikolaevitch Koshelev, Troitsk, RU;
Vladimir Vitalevitch Ivanov, Moscow, RU;
Vadim Yevgenyevich Banine, Helmond, NL;
Konstantin Nikolaevitch Koshelev, Troitsk, RU;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A patterned beam of radiation is projected onto a substrate. A reflective optical element is used to help form the radiation beam from radiation emitted from a plasma region of a plasma source. In the plasma source, a plasma current is generated in the plasma region. To reduce damage to the reflective optical element, a magnetic field is applied in the plasma region with at least a component directed along a direction of the plasma current. This axial magnetic field helps limit the collapse of the Z-pinch region of the plasma. By limiting the collapse, the number of fast ions emitted may be reduced.