The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 29, 2013
Filed:
Jun. 15, 2010
Keiichi Masunaga, Joetsu, JP;
Akinobu Tanaka, Joetsu, JP;
Daisuke Domon, Joetsu, JP;
Satoshi Watanabe, Joetsu, JP;
Youichi Ohsawa, Joetsu, JP;
Masaki Ohashi, Joetsu, JP;
Keiichi Masunaga, Joetsu, JP;
Akinobu Tanaka, Joetsu, JP;
Daisuke Domon, Joetsu, JP;
Satoshi Watanabe, Joetsu, JP;
Youichi Ohsawa, Joetsu, JP;
Masaki Ohashi, Joetsu, JP;
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Abstract
A polymer comprising a high proportion of aromatic ring structure-containing units and containing an aromatic sulfonic acid sulfonium salt on a side chain is used to form a chemically amplified positive photoresist composition which is effective in forming a resist pattern having high etch resistance. The polymer overcomes the problems of dissolution in solvents for polymerization and purification and in resist solvents.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile