The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 22, 2013

Filed:

Dec. 28, 2007
Applicants:

Srini Doddi, Fremont, CA (US);

Junjiang Lei, Bellevue, WA (US);

Kuang-hao Lay, Mountain View, CA (US);

Weiping Fang, Fremont, CA (US);

Inventors:

Srini Doddi, Fremont, CA (US);

Junjiang Lei, Bellevue, WA (US);

Kuang-Hao Lay, Mountain View, CA (US);

Weiping Fang, Fremont, CA (US);

Assignee:

Cadence Design Systems, Inc., San Jose, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method, system, and computer program product for preprocessing a pattern in a library of patterns and querying a preprocessed library of patterns are disclosed. Embodiments for querying a preprocessed library of patterns are disclosed for determining a distance between the representation for the first pattern and the representation for the second pattern, determining whether the distance between the representation for the first pattern and the representation for the second pattern is within the range for the first pattern, and transforming the second pattern with the transformation matrix to provide information about the second pattern. Embodiments for preprocessing a pattern in a library of patterns are disclosed for determining a transformation matrix for the first pattern, determining a range for the first pattern, wherein a distance between a representation for a first pattern and a representation for a second pattern is within the range and the second pattern can be transformed with the transformation matrix to provide information about the second pattern, and associating the range and the transformation matrix with the first pattern.


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