The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 15, 2013

Filed:

Sep. 29, 2008
Applicants:

Jeong Woo Jeon, Changwon-si, KR;

Hyun Seok OH, Suwon-si, KR;

Sung IL Chung, Pohang-si, KR;

Yeon Ho Jeong, Changwon-si, KR;

DO Hyun Kang, Changwwon, KR;

S. A. Nikiforov, Pohang-si, KR;

Mitica Caraiani, Pohang-si, KR;

Inventors:

Jeong Woo Jeon, Changwon-si, KR;

Hyun Seok Oh, Suwon-si, KR;

Sung Il Chung, Pohang-si, KR;

Yeon Ho Jeong, Changwon-si, KR;

Do Hyun Kang, Changwwon, KR;

S. A. Nikiforov, Pohang-si, KR;

Mitica Caraiani, Pohang-si, KR;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01F 7/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

The present invention provides a cylindrical magnetic levitation stage which includes a cylindrical substrate used to form micro-patterns of various arbitrary shapes on a large-area semiconductor substrate or display panel substrate, a cylindrical substrate, a combination of a first permanent magnet array and a first coil array and a combination of a first permanent magnet array and a first coil array, which are coupled to the cylindrical substrate, so that levitation, axial translation and rotation of the cylindrical substrate can be made finely through the control of a magnetic force generated by the interaction between a magnetic field generated by electric current applied to the coil arrays and a magnetic field generated from the permanent magnet arrays corresponding to the coil arrays.


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