The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 08, 2013
Filed:
Dec. 21, 2010
Vineet Wason, Santa Clara, CA (US);
Kevin J. Yang, Santa Clara, CA (US);
Sriram Balasubramanian, Fremont, CA (US);
Lingquan Wang, Santa Clara, CA (US);
Varsha Balakrishnan, Palo Alto, CA (US);
Juhi Bansal, Sunnyvale, CA (US);
Zhi-yuan Wu, Union City, CA (US);
Karthik Chandrasekaran, Essex Junction, VT (US);
Arunima Dasgupta, Essex Junction, VT (US);
Vineet Wason, Santa Clara, CA (US);
Kevin J. Yang, Santa Clara, CA (US);
Sriram Balasubramanian, Fremont, CA (US);
Lingquan Wang, Santa Clara, CA (US);
Varsha Balakrishnan, Palo Alto, CA (US);
Juhi Bansal, Sunnyvale, CA (US);
Zhi-Yuan Wu, Union City, CA (US);
Karthik Chandrasekaran, Essex Junction, VT (US);
Arunima Dasgupta, Essex Junction, VT (US);
GLOBALFOUNDRIES Inc., Grand Cayman, KY;
Abstract
Worst case performance of an SRAM cell may be simulated more accurately with less intensive computations. An embodiment includes determining, by a processor, a process corner G of an SRAM cell, having pull-down, pass-gate, and pull-up devices, process corner G being defined as the worst performance of the cell when only global variations of parameters of the SRAM cell are included, setting each of the pull-down, pass-gate, and pull-up devices at process corner G, performing, on the processor, a number of Monte Carlo simulations of the SRAM cell devices around process corner G with only local variations of the parameters, generating a normal probability distribution for Ibased on the local Monte Carlo simulations around process corner G, extrapolating the worst case Ifrom the normal probability distribution of Ito define a process corner SRM representing a slowest SRAM bit on a chip, and validating an SRAM cell based on the SRM corner. Embodiments further include creating a library of SRM corner values for multiple SRAM cells, and validating an SRAM cell by selecting an SRM corner from the library. Embodiments further include linearly scaling the SRM corner value with global sigma input variations from 0 sigma to 6 sigma and/or with local sigma input variations from 0 sigma to 6 sigma, selecting a scaled SRM corner value at the sigma corresponding to design and memory size requirements for the SRAM cell, simulating the scaled SRM corner by a processor, and employing the simulated scaled SRM corner to validate performance of an SRAM cell.