The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 08, 2013

Filed:

Feb. 18, 2011
Applicants:

Frank Laske, Weilmuenster, DE;

Christian Enkrich, Waldbronn, DE;

Eric Cotte, Dresden, DE;

Inventors:

Frank Laske, Weilmuenster, DE;

Christian Enkrich, Waldbronn, DE;

Eric Cotte, Dresden, DE;

Assignee:

KLA-Tencor MIE GmbH, Weilburg, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01); G06G 11/22 (2006.01); G03F 1/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method for the reproducible determination of the positions of structures () on a mask () is disclosed. A pellicle frame () is firmly attached to the mask (). A theoretical model of the bending of the mask () with the firmly attached pellicle frame () is calculated, wherein material properties of the mask (), of the pellicle frame (), and of the attaching means between the pellicle frame () and the mask () are taken into account in the calculation of the bending of the mask (). For the calculation of the bending of the mask () its contact with three support points is considered. The positions of the structures () on the mask () are measured with a metrology tool (). The measured positions of each structure are corrected with the theoretical model of the bending of the mask at the position of the respectively measured structure.


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