The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 25, 2012
Filed:
May. 01, 2012
Ulrich Loering, Schwaebisch Gmuend, DE;
Vladimir Kamenov, Essingen, DE;
Dirk Heinrich Ehm, Lauchheim, DE;
Stefan-wolfgang Schmidt, Aalen, DE;
Moritz Becker, Stuttgart, DE;
Andreas Wurmbrand, Aalen, DE;
Ulrich Loering, Schwaebisch Gmuend, DE;
Vladimir Kamenov, Essingen, DE;
Dirk Heinrich Ehm, Lauchheim, DE;
Stefan-Wolfgang Schmidt, Aalen, DE;
Moritz Becker, Stuttgart, DE;
Andreas Wurmbrand, Aalen, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
A projection lens of a projection exposure apparatus, for imaging a mask which can be positioned in an object plane onto a light-sensitive layer which can be positioned in an image plane, includes a housing, in which at least one optical element is arranged, at least one partial housing which is arranged within said housing and which at least regionally surrounds light passing from the object plane as far as the image plane during the operation of the projection lens, and a reflective structure, which reduces a light proportion which reaches the image plane after reflection at the at least one partial housing, by comparison with an analogous arrangement without said reflective structure.