The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 25, 2012
Filed:
Oct. 19, 2009
Applicants:
Jun Hatakeyama, Joetsu, JP;
Toshihiko Fujii, Joetsu, JP;
Takeru Watanabe, Joetsu, JP;
Youichi Ohsawa, Joetsu, JP;
Inventors:
Jun Hatakeyama, Joetsu, JP;
Toshihiko Fujii, Joetsu, JP;
Takeru Watanabe, Joetsu, JP;
Youichi Ohsawa, Joetsu, JP;
Assignee:
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/09 (2006.01); G03F 7/20 (2006.01); G03F 7/30 (2006.01); G03F 7/36 (2006.01); G03C 1/76 (2006.01);
U.S. Cl.
CPC ...
Abstract
A material comprising a novolac resin having a C-Caromatic hydrocarbon group substituted with a sulfo group or an amine salt thereof is useful in forming a photoresist undercoat. The undercoat-forming material has an extinction coefficient sufficient to provide an antireflective effect at a thickness of at least 200 nm, and a high etching resistance as demonstrated by slow etching rates with CF/CHFgas for substrate processing.