The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 11, 2012
Filed:
Jul. 02, 2010
Harry Hak-lay Chuang, Hsinchu, TW;
Bao-ru Young, Zhubei, TW;
Sheng-chen Chung, Jhubei, TW;
Kai-shyang You, Zhubei, TW;
Jin-aun NG, Hsinchu, TW;
Wei Cheng Wu, Zhubei, TW;
Ming Zhu, Singapore, SG;
Harry Hak-Lay Chuang, Hsinchu, TW;
Bao-Ru Young, Zhubei, TW;
Sheng-Chen Chung, Jhubei, TW;
Kai-Shyang You, Zhubei, TW;
Jin-Aun Ng, Hsinchu, TW;
Wei Cheng Wu, Zhubei, TW;
Ming Zhu, Singapore, SG;
Taiwan Semiconductor Manufacturing Company. Ltd., Hsin-Chu, TW;
Abstract
A method includes providing a substrate having a first surface, forming an isolation structure disposed partly in the substrate and having an second surface higher than the first surface by a step height, removing a portion of the isolation structure to form a recess therein having a bottom surface spaced from the first surface by less than the step height, forming a gate structure, and forming a contact engaging the gate structure over the recess. A different aspect involves an apparatus that includes a substrate having a first surface, an isolation structure disposed partly in the substrate and having a second surface higher than the first surface by a step height, a recess extending downwardly from the second surface, the recess having a bottom surface spaced from the first surface by less than the step height, a gate structure, and a contact engaging the gate structure over the recess.