The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 11, 2012
Filed:
Aug. 21, 2009
Takashi Sone, Nirasaki, JP;
Eiichi Nishimura, Nirasaki, JP;
Takashi Sone, Nirasaki, JP;
Eiichi Nishimura, Nirasaki, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A substrate processing method for processing a substrate, on which a processing target layer, an intermediate layer, and a mask layer having an opening to expose a part of the intermediate layer are stacked in this order, includes a shrink etching step. In the shrink etching step, an opening width of the opening of the mask layer is reduced by depositing deposits on a sidewall surface thereof by a plasma generated from a gaseous mixture of depositive gas expressed by a general formula CHF(x, y and z being positive integers) and SFgas. Also, there is formed in the intermediate layer an opening having an opening width corresponding to the reduced opening width of the opening of the mask layer by etching the intermediate layer.