The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 04, 2012

Filed:

Feb. 21, 2008
Applicants:

Thomas Ortleb, Dresden, DE;

Markus Nopper, Dresden, DE;

Dirk Wollstein, Dresden, DE;

Inventors:

Thomas Ortleb, Dresden, DE;

Markus Nopper, Dresden, DE;

Dirk Wollstein, Dresden, DE;

Assignee:

Advanced Micro Devices, Inc., Austin, TX (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C25D 21/12 (2006.01); C25D 5/00 (2006.01); C25D 5/02 (2006.01); C25C 14/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of automatic deposition profile targeting for electrochemically depositing copper with a position-dependent controllable plating tool including the steps of depositing copper on a patterned product wafer, measuring an actual thickness profile of the deposited copper and generating respective measurement data, feeding the measurement data to an advanced process control (APC) model and calculating individual corrections for plating parameters in the position-dependent controllable plating tool.


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