The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 8323414 B1

PDF
Full Text
Expired
Date of Patent:
Dec. 04, 2012

Filed:

Oct. 19, 2011
Applicants:

Tsuyoshi Moriya, Nirasaki, JP;

Hiroshi Nagaike, Nirasaki, JP;

Inventors:

Tsuyoshi Moriya, Nirasaki, JP;

Hiroshi Nagaike, Nirasaki, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B08B 6/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A particle removal apparatus for removing particles from a chamber of a plasma processing apparatus, wherein the chamber is connected to a gas exhaust port and a plasma of a processing gas is generated in the chamber to plasma process a substrate to be processed, includes a particle charging control member for positively charging particles generated within the chamber by positive ions of an ion sheath region formed in a region other than the vicinity of the substrate to be processed, wherein positively charged particles are discharged from the chamber via the gas exhaust port. Therefore, there is no plasma disturbance or metal contamination, and thus can be applied to a practical use.


Find Patent Forward Citations

Moriya, Tsuyoshi. (2012). Particle removal apparatus and method and plasma processing apparatus (U.S. Patent No. 8323414). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8323414

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