The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 27, 2012
Filed:
Dec. 04, 2008
Richard Johannes Franciscus Van Haren, Waalre, NL;
Sanjaysingh Lalbahadoersing, Helmond, NL;
Sami Musa, Veldhoven, NL;
Patrick Warnaar, Tilburg, NL;
Maya Angelova Doytcheva, Eindhoven, NL;
Richard Johannes Franciscus Van Haren, Waalre, NL;
Sanjaysingh Lalbahadoersing, Helmond, NL;
Sami Musa, Veldhoven, NL;
Patrick Warnaar, Tilburg, NL;
Maya Angelova Doytcheva, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
The invention relates to a marker structure for optical alignment of a substrate and provided thereon. The marker structure has a first reflecting surface at a first level and a second reflecting surface at a second level. A separation between the first level and the second level determines a phase depth condition. The marker structure further has an additional structure. The additional structure is arranged to modify the separation during manufacture of the marker structure. The invention further relates to a method of forming such a marker structure.