The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 27, 2012
Filed:
Aug. 07, 2009
Sven Beyer, Dresden, DE;
Kai Frohberg, Niederau, DE;
Katrin Reiche, Goltzscha, DE;
Kerstin Ruttloff, Hainichen, DE;
Sven Beyer, Dresden, DE;
Kai Frohberg, Niederau, DE;
Katrin Reiche, Goltzscha, DE;
Kerstin Ruttloff, Hainichen, DE;
Advanced Micro Devices, Inc., Austin, TX (US);
Abstract
A contact element may be formed on the basis of a hard mask, which may be patterned on the basis of a first resist mask and on the basis of a second resist mask, to define an appropriate intersection area which may represent the final design dimensions of the contact element. Consequently, each of the resist masks may be formed on the basis of a photolithography process with less restrictive constraints, since at least one of the lateral dimensions may be selected as a non-critical dimension in each of the two resist masks.