The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 06, 2012

Filed:

Aug. 26, 2008
Applicants:

Veeraraghavan S. Basker, Yorktown Heights, NY (US);

John M. Cotte, New Fairfield, CT (US);

Hariklia Deligianni, Tenafly, NJ (US);

Matteo Flotta, Fishkill, NY (US);

Inventors:

Veeraraghavan S. Basker, Yorktown Heights, NY (US);

John M. Cotte, New Fairfield, CT (US);

Hariklia Deligianni, Tenafly, NJ (US);

Matteo Flotta, Fishkill, NY (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C25D 7/12 (2006.01); C25D 5/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

An electrochemical process comprising: providing a 125 mm or larger semiconductor wafer in electrical contact with a conducting surface, wherein at least a portion of the semiconductor wafer is in contact with an electrolytic solution, said semiconductor wafer functioning as a first electrode; providing a second electrode in the electrolytic solution, the first and second electrode connected to opposite ends of an electric power source; and irradiating a surface of the semiconductor wafer with a light source as an electric current is applied across the first and the second electrodes. The invention is also directed to an apparatus including a light source and electrochemical components to conduct the electrochemical process.


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