The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 30, 2012
Filed:
Jul. 24, 2009
Applicants:
Christian Dussarrat, Wilmington, DE (US);
Clement Lansalot-matras, Tsukuba, JP;
Inventors:
Christian Dussarrat, Wilmington, DE (US);
Clement Lansalot-Matras, Tsukuba, JP;
Assignee:
American Air Liquide, Inc., Fremont, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B05D 3/02 (2006.01);
U.S. Cl.
CPC ...
Abstract
Methods and compositions for depositing a film on one or more substrates include providing a reactor with at least one substrate disposed in the reactor. At least one metal precursor are provided and at least partially deposited onto the substrate to form a metal-containing film.
Dussarrat, Christian. (2012). Heteroleptic cyclopentadienyl transition metal precursors for deposition of transition metal-containing films (U.S. Patent No. 8298616). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8298616
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile