The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 23, 2012
Filed:
Mar. 16, 2009
Huiwen Liu, Eden Prairie, MN (US);
Lin Zhou, Eagan, MN (US);
Dale Egbert, Deephaven, MN (US);
Jonathan Arland Nelson, Maple Grove, MN (US);
Peter Gunderson, Ellsworth, WI (US);
Huiwen Liu, Eden Prairie, MN (US);
Lin Zhou, Eagan, MN (US);
Dale Egbert, Deephaven, MN (US);
Jonathan Arland Nelson, Maple Grove, MN (US);
Peter Gunderson, Ellsworth, WI (US);
Seagate Technology LLC, Cupertino, CA (US);
Abstract
An atomic force microscopy (AFM) method includes a scanning probe that scans a surface of a structure to produce a first structure image. The structure is then rotated by 90° with respect to the scanning probe. The scanning probe scans the surface of the structure again to produce a second structure image. The first and second structure images are combined to produce best fit image of the surface area of the structure. The same method is used to produce the best fit image of a flat standard. The best fit image of the flat standard is subtracted from the best fit image of the structure to obtain a true topographical image in which Z direction run out error is substantially reduced or eliminated.