The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 23, 2012
Filed:
Jul. 19, 2010
Sunny Wu, Zhudong Town, TW;
Yen-di Tsen, Chung-Ho, TW;
Chun-hsien Lin, Hsin-Chu, TW;
Keung Hui, Hsin-Chu, TW;
JO Fei Wang, Hsin-Chu, TW;
Jong-i Mou, Hsinpu Township, TW;
Sunny Wu, Zhudong Town, TW;
Yen-Di Tsen, Chung-Ho, TW;
Chun-Hsien Lin, Hsin-Chu, TW;
Keung Hui, Hsin-Chu, TW;
Jo Fei Wang, Hsin-Chu, TW;
Jong-I Mou, Hsinpu Township, TW;
Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;
Abstract
An embodiment is a method for semiconductor processing control. The method comprises identifying a key process stage from a plurality of process stages based on a parameter of processed wafers, forecasting a trend for a wafer processed by the key process stage and some of the plurality of process stages based on the parameter, and dispatching the wafer to one of a first plurality of tools in a tuning process stage. The one of the first plurality of tools is determined based on the trend.