The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 23, 2012
Filed:
Jan. 14, 2010
Ralf Mueller, Aalen, DE;
Toralf Gruner, Aalen-Hofen, DE;
Michael Totzeck, Schwaebisch Gmuend, DE;
Heiko Feldmann, Aalen, DE;
Hans-jochen Paul, Aalen, DE;
Ralf Mueller, Aalen, DE;
Toralf Gruner, Aalen-Hofen, DE;
Michael Totzeck, Schwaebisch Gmuend, DE;
Heiko Feldmann, Aalen, DE;
Hans-Jochen Paul, Aalen, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
An optical system of a microlithographic projection exposure apparatus permits comparatively flexible and fast influencing of the intensity distribution and/or the polarization state. The optical system includes at least one layer system that is at least one-side bounded by a lens or a mirror. The layer system is an interference layer system of several layers and has at least one liquid or gaseous layer portion with a maximum thickness of one micrometer (μm), and a manipulator for manipulation of the thickness profile of the layer portion.