The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 09, 2012
Filed:
Mar. 23, 2011
Eugene Smargiassi, Tualatin, OR (US);
Boaz Kenane, Portland, OR (US);
James Lee, Damascus, OR (US);
Xiaolan Chen, Tigard, OR (US);
Eugene Smargiassi, Tualatin, OR (US);
Boaz Kenane, Portland, OR (US);
James Lee, Damascus, OR (US);
Xiaolan Chen, Tigard, OR (US);
Novellus Systems, Inc., San Jose, CA (US);
Abstract
Provided are improved apparatus and methods for radiative treatment. In some embodiments, a semiconductor processing apparatus for radiative cure includes a process chamber and a radiation assembly external to the process chamber. The radiation assembly transmits radiation into the chamber on a substrate holder through a chamber window. A radiation detector measures radiation intensity from time to time. The assembly includes a gas inlet and exhaust operable to flow a radiation-activatable cooling gas through the radiation assembly.