The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 02, 2012
Filed:
Mar. 12, 2009
Stephan Six, Aalen, DE;
Michael Lill, Kaiserslautern, DE;
Ruediger Duesing, Neu-Ulm, DE;
Bernhard Gellrich, Aalen, DE;
Michael Widmann, Aalen, DE;
Andreas Schubert, Limbach-Oberfrohna, DE;
Tilmann Von Papen, Aalen, DE;
Thomas Ihl, Aalen, DE;
Stephan Six, Aalen, DE;
Michael Lill, Kaiserslautern, DE;
Ruediger Duesing, Neu-Ulm, DE;
Bernhard Gellrich, Aalen, DE;
Michael Widmann, Aalen, DE;
Andreas Schubert, Limbach-Oberfrohna, DE;
Tilmann Von Papen, Aalen, DE;
Thomas Ihl, Aalen, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
An optical arrangement for immersion lithography, having at least one component () to which a hydrophobic coating () is applied, the hydrophobic coating () being exposed to UV radiation during operation of a projection lens, and the at least one component () being wetted at least in part by an immersion fluid during operation of the projection lens. The hydrophobic coating () includes at least one UV-resistant layer () that absorbs and/or reflects UV radiation at a wavelength of less than 260 nm.