The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 02, 2012
Filed:
Mar. 03, 2009
Masahiro Tsunoda, Hitachinaka, JP;
Kouki Miyahara, Hitachinaka, JP;
Katsuya Kawakami, Mito, JP;
Takashi Gunji, Mito, JP;
Masahiro Tsunoda, Hitachinaka, JP;
Kouki Miyahara, Hitachinaka, JP;
Katsuya Kawakami, Mito, JP;
Takashi Gunji, Mito, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
A charged particle beam system for measuring a sample such as a photomask is provided. The system is capable of adjusting its condition with high accuracy to measure the sample even when a back surface of the sample is charged. The charged particle beam system measures an electric potential distribution on the back surface of the sample during a process for transporting the sample. The system controls the degree of charge neutralization of the sample based on the result of the measurement, or estimates or calculates an electric potential distribution appearing on a front surface of the sample and obtained when the sample is placed on the sample holder or the like. The system is capable of measuring or inspecting the sample such as a photomask at high speed and with high accuracy even when the sample has a large amount of charges accumulated on its surface different from its pattern surface.