The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 11, 2012
Filed:
Apr. 21, 2009
Palash P. Das, Oceanside, CA (US);
Thomas Hofmann, San Diego, CA (US);
Jesse D. Davis, Coronado, CA (US);
Richard L. Sandstrom, Encinitas, CA (US);
Palash P. Das, Oceanside, CA (US);
Thomas Hofmann, San Diego, CA (US);
Jesse D. Davis, Coronado, CA (US);
Richard L. Sandstrom, Encinitas, CA (US);
Cymer, Inc., San Diego, CA (US);
Abstract
A laser crystallization apparatus and method are disclosed for selectively melting a film such as amorphous silicon that is deposited on a substrate. The apparatus may comprise an optical system for producing stretched laser pulses for use in melting the film. In still another aspect of an embodiment of the present invention, a system and method are provided for stretching a laser pulse. In another aspect, a system is provided for maintaining a divergence of a pulsed laser beam (stretched or non-stretched) at a location along a beam path within a predetermined range. In another aspect, a system may be provided for maintaining the energy density at a film within a predetermined range during an interaction of the film with a shaped line beam.