The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 11, 2012
Filed:
Jan. 31, 2006
Erik Roelof Loopstra, Heeze, NL;
Bernardus Antonius Johannes Luttikhuis, Nuenen, NL;
Harmen Klaas Van Der Schoot, Vught, NL;
Fransicus Mathijs Jacobs, Asten, NL;
Erik Roelof Loopstra, Heeze, NL;
Bernardus Antonius Johannes Luttikhuis, Nuenen, NL;
Harmen Klaas Van Der Schoot, Vught, NL;
Fransicus Mathijs Jacobs, Asten, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
The invention provides a lithographic apparatus including an illumination system configured to condition a radiation beam, a patterning device support constructed to support a transmissive patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto a target portion of the substrate, wherein the patterning device support is configured to hold a patterning device and wherein the lithographic apparatus includes a clamping device, the clamping device being configured to clamp the patterning device at the top side.