The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 11, 2012
Filed:
Apr. 17, 2009
Kensaku Narushima, Nirasaki, JP;
Satoshi Wakabayashi, Nirasaki, JP;
Takamitsu Takayama, Nirasaki, JP;
Kensaku Narushima, Nirasaki, JP;
Satoshi Wakabayashi, Nirasaki, JP;
Takamitsu Takayama, Nirasaki, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A Ti-based film forming method includes a step (step 1) of cleaning inside a chamber by introducing a cleaning gas containing fluorine into the chamber in a state where a wafer W is not provided on a susceptor; a step (step 2) of heating the susceptor in a state where the wafer W is not provided on the susceptor, injecting a processing gas containing Ti from a shower head into the chamber, and forming a pre-coated film at least on the surface of the shower head; and a step (step 3) of mounting the wafer W on the susceptorin a state where the susceptor is heated, supplying a processing gas into the chamberand forming a Ti-based film on the wafer W. The pre-coated film forming step is performed at a temperature lower than that in the film forming step.