The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 04, 2012

Filed:

Mar. 29, 2011
Applicant:

Richard A. Yarussi, San Francisco, CA (US);

Inventor:

Richard A. Yarussi, San Francisco, CA (US);

Assignee:

Nanometrics Incorporated, Milpitas, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01J 3/28 (2006.01);
U.S. Cl.
CPC ...
Abstract

An optical metrology system collects data while scanning over the focal range. The data is evaluated to determine a peak intensity value from the data. In one embodiment, only data from one side of the peak value is used. The characteristic of the sample is determined based on the peak value. In one embodiment, monochromatic light is used. In another embodiment, polychromatic light is used and peak intensity values for a plurality of wavelengths are determine and combined to form a measured spectrum for the sample, which can then be used to determine the sample properties of interest. In one embodiment, the peak intensity is determined using curve fitting.


Find Patent Forward Citations

Yarussi, Richard. (2012). Scanning focal length metrology (U.S. Patent No. 8259297). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8259297

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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