The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 04, 2012
Filed:
Mar. 20, 2009
Daniël Jozef Maria Direcks, Simpelveld, NL;
Nicolaas Rudolf Kemper, Eindhoven, NL;
Paulus Martinus Maria Liebregts, Veldhoven, NL;
Ronald Van Der Ham, Maarheeze, NL;
Wilhelmus Franciscus Johannes Simons, Beesel, NL;
Danny Maria Hubertus Philips, Son en Breugel, NL;
Gert-jan Gerardus Johannes Thomas Brands, Waalre, NL;
Koen Steffens, Veldhoven, NL;
Han Henricus Aldegonda Lempens, Weert, NL;
Marcus Johannes Van Der Zanden, Boekel, NL;
Pieter Mulder, Duizel, NL;
Daniël Jozef Maria Direcks, Simpelveld, NL;
Nicolaas Rudolf Kemper, Eindhoven, NL;
Paulus Martinus Maria Liebregts, Veldhoven, NL;
Ronald Van Der Ham, Maarheeze, NL;
Wilhelmus Franciscus Johannes Simons, Beesel, NL;
Danny Maria Hubertus Philips, Son en Breugel, NL;
Gert-Jan Gerardus Johannes Thomas Brands, Waalre, NL;
Koen Steffens, Veldhoven, NL;
Han Henricus Aldegonda Lempens, Weert, NL;
Marcus Johannes Van Der Zanden, Boekel, NL;
Pieter Mulder, Duizel, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
An immersion lithographic apparatus is described in which a droplet removal device removes droplets from the substrate, e.g. during exposures, using an angled flow of gas from a gas knife.