The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 04, 2012
Filed:
Mar. 28, 2011
Seiichi Kaise, Nirasaki, JP;
Noriyuki Iwabuchi, Miyagi-gun, JP;
Shigeaki Kato, Miyagi-gun, JP;
Hiroshi Nakamura, Nirasaki, JP;
Takeshi Yokouchi, Miyagi-gun, JP;
Mariko Shibata, Miyagi-gun, JP;
Akira Obi, Nirasaki, JP;
Seiichi Kaise, Nirasaki, JP;
Noriyuki Iwabuchi, Miyagi-gun, JP;
Shigeaki Kato, Miyagi-gun, JP;
Hiroshi Nakamura, Nirasaki, JP;
Takeshi Yokouchi, Miyagi-gun, JP;
Mariko Shibata, Miyagi-gun, JP;
Akira Obi, Nirasaki, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A substrate processing method is used for a substrate processing system having a substrate processing device and a substrate transfer device. The substrate processing method includes a substrate transfer step of transferring a substrate and a substrate processing step of performing a predetermined process on the substrate. The substrate transfer step and the substrate processing step include a plurality of operations, and at least two operations among the plurality of the operations are performed simultaneously. Preferably, the substrate processing device includes an accommodating chamber, a mounting table placed in the accommodating chamber to be mounted thereon the substrate, and a heat transfer gas supply line for supplying a heat transfer gas to a space between the substrate mounted on the mounting table and the mounting table.