The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 28, 2012
Filed:
Sep. 03, 2009
Shoutian LI, Naperville, IL (US);
Steven Grumbine, Aurora, IL (US);
Jeffrey Dysard, St. Charles, IL (US);
Pankaj Singh, Plainfield, IL (US);
Shoutian Li, Naperville, IL (US);
Steven Grumbine, Aurora, IL (US);
Jeffrey Dysard, St. Charles, IL (US);
Pankaj Singh, Plainfield, IL (US);
Cabot Microelectronics Corporation, Aurora, IL (US);
Abstract
The invention provides a chemical-mechanical polishing composition for polishing a substrate. The polishing composition comprises silica, a compound selected from the group consisting of an amine-substituted silane, a tetraalkylammonium salt, a tetraalkylphosphonium salt, and an imidazolium salt, a carboxylic acid having seven or more carbon atoms, an oxidizing agent that oxidizes a metal, and water. The invention further provides a method of chemically-mechanically polishing a substrate with the aforementioned polishing composition.