The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 07, 2012
Filed:
Nov. 06, 2003
Tze Ho Simon Chan, Singapore, SG;
Weining LI, Shanghai, CN;
Elgin Quek, Singapore, SG;
Jia Zhen Zheng, Singapore, SG;
Pradeep Ramachandramurthy Yelehanka, Singapore, SG;
Tommy Lai, Kowloon, HK;
Tze Ho Simon Chan, Singapore, SG;
Weining Li, Shanghai, CN;
Elgin Quek, Singapore, SG;
Jia Zhen Zheng, Singapore, SG;
Pradeep Ramachandramurthy Yelehanka, Singapore, SG;
Tommy Lai, Kowloon, HK;
GLOBALFOUNDRIES Singapore Pte. Ltd., Singapore, SG;
Abstract
A method for manufacturing an integrated circuit structure includes providing a semiconductor substrate and forming two trenches in the semiconductor substrate to define an active region therebetween. An implanted source region is formed in one of the trenches on one side of the active region. An implanted drain region is formed in the other trench on the other side of the active region. Shallow trench isolations are then formed in the trenches. One or more gates are formed over the active region, and contacts to the implanted source region and the implanted drain region are formed.