The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 07, 2012
Filed:
Mar. 14, 2007
Applicants:
Hsiao-tzu LU, Hsinchu, TW;
Hung Chang Hsieh, Hsin-Chu, TW;
Kuei Shun Chen, Hsin-Chu, TW;
Hsueh-hung Fu, Hsinchu, TW;
Ching-hua Hsieh, Hsinchu, TW;
Shau-lin Shue, Hsinchu, TW;
Inventors:
Hsiao-Tzu Lu, Hsinchu, TW;
Hung Chang Hsieh, Hsin-Chu, TW;
Kuei Shun Chen, Hsin-Chu, TW;
Hsueh-Hung Fu, Hsinchu, TW;
Ching-Hua Hsieh, Hsinchu, TW;
Shau-Lin Shue, Hsinchu, TW;
Assignee:
Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
Methods and systems for lithographically exposing a substrate based on a curvature profile of the substrate.