The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 24, 2012

Filed:

Jun. 26, 2009
Applicants:

Emmanuel Jean-marc Beaurepaire, Palaiseau, FR;

Nicolas Olivier, Paris, FR;

Delphine Debarre, Paris, FR;

Marie-claire Schanne-klein, Verrieres le Buisson, FR;

Jean-louis Martin, Bures sur Yvette, FR;

Inventors:

Emmanuel Jean-Marc Beaurepaire, Palaiseau, FR;

Nicolas Olivier, Paris, FR;

Delphine Debarre, Paris, FR;

Marie-Claire Schanne-Klein, Verrieres le Buisson, FR;

Jean-Louis Martin, Bures sur Yvette, FR;

Assignee:

Ecole Polytechnique, Palaiseau, FR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/64 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method for the dimensional characterization of a structured material, in which method: an excitation laser beam suitable for coherent nonlinear microscopy is generated, this excitation laser beam being focused in a focal volume within the structured material; signals emitted by the structured material are detected; a plurality of emission patterns, each corresponding to one particular shape of the focal volume, is produced, the particular shapes being obtained for various non-Gaussian spatial profiles of the excitation laser beam wavefront; and on the basis of the emission patterns thus produced, dimensional characteristics of the structured material are deduced therefrom.


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