The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 24, 2012
Filed:
Jan. 11, 2010
Takahiro Dazai, Kawasaki, JP;
Daiju Shiono, Kawasaki, JP;
Tomoyuki Hirano, Kawasaki, JP;
Tasuku Matsumiya, Kawasaki, JP;
Daichi Takaki, Kawasaki, JP;
Takayoshi Mori, Kawasaki, JP;
Junichi Tsuchiya, Kawasaki, JP;
Takahiro Dazai, Kawasaki, JP;
Daiju Shiono, Kawasaki, JP;
Tomoyuki Hirano, Kawasaki, JP;
Tasuku Matsumiya, Kawasaki, JP;
Daichi Takaki, Kawasaki, JP;
Takayoshi Mori, Kawasaki, JP;
Junichi Tsuchiya, Kawasaki, JP;
Tokyo Ohka Kogyo Co., Ltd., Kawasaki-shi, JP;
Abstract
A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of an acid, and an acid generator component (B), wherein the base component (A) includes a polymeric compound (A0) containing a structural unit (a0) represented by the general formula (a0-1) shown below: (wherein, Rrepresents a hydrogen atom, an alkyl group or a halogenated alkyl group; Rrepresents a bivalent linking group containing at least one kind of polar groups selected from the group consisting of —O—, —C(═O)—, —C(═O)—O—, a carbonate linkage (—O—C(═O)—O—), —S—, —S(═O)—, —S(═O)—O—, —NH—, —NR— (wherein, Rrepresents an alkyl group or an acyl group), and —NH—C(═O)—; and Rrepresents a cyclic group containing a sulfonyl group within the ring skeleton).