The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 17, 2012
Filed:
May. 26, 2011
Eun-jung Yun, Seoul, KR;
Min-sang Kim, Seoul, KR;
Sung-min Kim, Incheon, KR;
Sung-young Lee, Yongin-si, KR;
Ji-myoung Lee, Yongin-si, KR;
In-hyuk Choi, Seoul, KR;
Eun-Jung Yun, Seoul, KR;
Min-Sang Kim, Seoul, KR;
Sung-Min Kim, Incheon, KR;
Sung-Young Lee, Yongin-si, KR;
Ji-Myoung Lee, Yongin-si, KR;
In-Hyuk Choi, Seoul, KR;
Abstract
A multibit electro-mechanical memory device comprises a substrate, a bit line on the substrate, a first interlayer insulating film on the bit line, first and second lower word lines on the first interlayer insulating film, the first and second lower word lines separated horizontally from each other by a trench, a spacer abutting a sidewall of each of the first and second lower word lines, a pad electrode inside a contact hole, first and second cantilever electrodes suspended over first and second lower voids that correspond to upper parts of the first and second lower word lines provided in both sides on the pad electrode, the first and second cantilever electrodes being separated from each other by the trench, and being curved in a third direction that is perpendicular to the first and second direction; a second interlayer insulating film on the pad electrode, first and second trap sites supported by the second interlayer insulating film to have first and second upper voids on the first and second cantilever electrodes, and first and second upper word lines on the first and second trap sites.