The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 17, 2012
Filed:
Mar. 22, 2010
Applicants:
Chun-ming Wang, Fremont, CA (US);
Chen-che Huang, Campbell, CA (US);
Masaaki Higashitani, Cupertino, CA (US);
Inventors:
Chun-Ming Wang, Fremont, CA (US);
Chen-Che Huang, Campbell, CA (US);
Masaaki Higashitani, Cupertino, CA (US);
Assignee:
SanDisk Technologies Inc., Plano, TX (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/36 (2012.01); G03C 5/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A photomask for exposure of a semiconductor wafer using dipole illumination and method of manufacturing the same is disclosed. A method of forming a pattern on a semiconductor using the photomask is also disclosed. The photomask may have an array of islands that are used for printing lines using dipole illumination. The photomask may have sub-resolution assist features (SRAF) to assist in printing the lines. The SRAF may include an array of holes.